Aligner (MJB3)

Additional information

MANUFACTURER Karl Süss
MODEL MJB3

Samples

  • Photomasks sizes : 75 mm maximum
  • Samples sizes : 10 mm to 50 mm

Characteristics

  • Spectral selection : Near UV or far UV (wide spectrum)

 

ROUTINE PROCESS

Contact mode Photolithography

On : positive resists

  • Minimum feature size : 1 µm
  • Resist thickness : 0.5 µm to 2 µm

To use this equipment

The equipment available is accessible to the academic and industrial research community.

To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.

  • This field is for validation purposes and should be left unchanged.