Aligner (MJB3)
Aligner (MJB3)
Additional information
| MANUFACTURER | Karl Süss |
|---|---|
| MODEL | MJB3 |
Samples
- Photomasks sizes : 75 mm maximum
- Samples sizes : 10 mm to 50 mm
Characteristics
- Spectral selection : Near UV or far UV (wide spectrum)
ROUTINE PROCESS
Contact mode Photolithography
On : positive resists
- Minimum feature size : 1 µm
- Resist thickness : 0.5 µm to 2 µm
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.