X-ray photoelectron spectroscopy (XPS)
X-ray photoelectron spectroscopy (XPS)
| MANUFACTURER | Physical Electronics |
|---|---|
| MODEL | Quantera II |
General description:
Molecular chemical analysis of the first atomic layers of a surface. Provides high sensitivity large and micro-area spectroscopy, superior inorganic and organic depth profiling and fully automated analysis of insulating or conductive samples.
Characteristics :
- Focussed and scanned X-Ray beam for sample imaging and analysis
- Xray spot size programmable between 9µm and 300µm (min. ≤ 7.5 µm)
- Spherical capacitor energy analyser with multi-channel detection
- High performance low voltage Argon sputter ion gun ( ≥ 5.0 µA @ 5 kV )
- Dual beam charge compensation
- Large travel 5 axis precision sample stage
- Robotic sample platen handling
- Sample size 75mm x 75mm x 25mm or 100 mm round (4 inch wafer)
- Ultra high vacuum analytical chamber to prevent contamination
- System vacuum ≤ 6.7 x10-8 Pa
- Ar ion sputter gun differential pressure ≤ 6.7 x 10-6 Pa
- Elemental sensitivity ≥ 15 000 cps at ≤ 0.6 eV, on Ag 3d5
- Highest performance inorganic and organic sputter depth profiling
- Hand-off dual beam charge neutralization
- Fully automated and internet ready for remote operation
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.