SILICON QUANTUM DOTS FOR ELECTRONIC MEMORIES

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+EFFICIENT +SMALL +INTEGRATED

Memory cards and other USB keys are an integral part of our daily lives. Professor Drouin’s approach could revolutionize their design.

Arrays of holes infinitely small in a layer of silicon nitride were obtained by combining e-beam lithography and plasma etching. Next, a short pulse of electrochemical current allows the formation of one silicon nanocrystal per hole. This results in a high-quality crystal array with a reproducible morphology, making it addressable in a real storage system.

REFERENCE

[1] A. Ayari-Kanoun, A. Jaouad, A. Souifi, D. Drouin, J. Beauvais, Journal of Vacuum Science & Technology B, 29 (5), 051802 (2011)

RESEARCHERS

Pr. D. Drouin and Pr. J. Beauvais (Université de Sherbrooke), Pr. A Souifi (INSA Lyon)

IRDQ CONTRIBUTION

Skills

Posted on

26/02/2021