Laser Photolithography

$0.00

Description

Additional information

MANUFACTURER Heidelberg
MODEL DWL-66FS

Samples

  • Photomask size  : 152 mm (6 in.) maximum
  • Sample size : 152 mm maximum
  • Thickness : 10 mm maximum

Characteristics

  • Alignment precision: from 200 nm to 2000 nm (according to the resolution)
  • Laser diode, wavelength: 405 nm
  • Writing speed: from 1 mm²/min to 290 mm²/min (according to the resolution)

 

ROUTINE PROCESS

Photolithography

On negative resist

  • Minimum feature size : 2 µm
  • Thickness : from 1 µm to 3 µm

 

ROUTINE PROCESS

Photolithography

On positive resist

  • Minimum feature size : 1 µm
  • Thickness : from 1.5 µm to 7 µm

Additional information

MANUFACTURER

Heidelberg

MODEL

DWL-66FS