Description
Additional information
| MANUFACTURER | OAI |
|---|---|
| MODEL | 200 |
Samples
- Photomasks sizes : 127 mm maximum
- Samples sizes : 10 mm to 100 mm
Characteristics
- Spectral selection : Near UV or far UV (wide spectrum)
ROUTINE PROCESS
Contact mode Photolithography
On : positive resists
- Minimum feature size : 1 µm
- Resist thickness : 0.5 µm to 2 µm
ROUTINE PROCESS
Contact mode Photolithography
On : negative resists
- Minimum feature size : 5 µm
- Resist thickness : 5 µm to 1000 µm
