Description
Additional information
| MANUFACTURER | Heidelberg |
|---|---|
| MODEL | DWL-66FS |
Samples
- Photomask size : 152 mm (6 in.) maximum
- Sample size : 152 mm maximum
- Thickness : 10 mm maximum
Characteristics
- Alignment precision: from 200 nm to 2000 nm (according to the resolution)
- Laser diode, wavelength: 405 nm
- Writing speed: from 1 mm²/min to 290 mm²/min (according to the resolution)
ROUTINE PROCESS
Photolithography
On negative resist
- Minimum feature size : 2 µm
- Thickness : from 1 µm to 3 µm
ROUTINE PROCESS
Photolithography
On positive resist
- Minimum feature size : 1 µm
- Thickness : from 1.5 µm to 7 µm
