Leica RES 101
Leica RES 101
| MANUFACTURER | Leica microsystems |
|---|---|
| MODEL | RES 101 |
General description:
Ion beam preparation for thinning, cleaning and in-situ coating in one single system. This technique minimize the smearing generally associated with cross sectioning in soft material and for certain application can revealed sample microstructure.
Characteristics :
- Sample up to 25 mm Ø
- In-Situ coating of SEM and TEM sample with various target material
- Surface cleaning, milling for contrast enhancement
- Ion energy : 1keV to 10 KeV
- Source current : up to 3.5 mA (per ion source)
- Ion current density: 10 mA/sq cm (per ion source)
- Milling rate : Cu 40μm/h (8kV,3mA)per ion source at 15 deg angle
- Si 25μm/h (8kV,3mA)per ion source at 30 deg angle
- Gaz: Argon, minimal purity 99.999% (Ar 5.0)
- Angle tilting: Gun 1 +/- 45 deg (0.1 deg setting accuracy)
- Gun 2 +/- 45 deg (0.1 deg setting accuracy)
- Sample holder tilting: -120 to 210 deg (0.1 deg setting accuracy)
- Milling angle: 0 to 90 deg (dependent on the sample holder)
- Sample holder movement: Rotation 0.6 to 10 rpm
- Oscillation up to 360 deg, in 1 deg steps
- Movement x direction +/- 5 mm, 0.1 mm accuracy
- Vaccum oil free ≤ 1×10-5 mbar
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.