Ion Implantation (N/A)
Ion Implantation (N/A)
Additional information
| MANUFACTURER | N/A |
|---|---|
| MODEL | N/A |
Samples
- Samples size : from 1 mm to 50 mm
Characteristics
- Apparatus unique in Canada, allowing implantations up to 10 MeV
- Temperature : from – 190 °C to 300 °C
- Accelerating voltage : from 5 keV to 75 000 keV (depending on the ion)
ROUTINE PROCESS
Ion Implantation
- Material implanted: all solids
- Dose : from 1.00+10 to 1.00+18 atoms/cm2
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.