Description
Additional information
| MANUFACTURER | EV Group |
|---|---|
| MODEL | EVG 620 |
Samples
- Photomasks size : 178 mm (7 in.) maximum
- Samples size : 150 mm maximum
Caracteristics
- Source : Mercury lamp 1 000 W
- Spectral selection : I-line
- Optics: Dielectric mirror mid-range UV (350 nm – 450 nm)
- Wavelength selection possible via pass-band filter
- Exposure mode : proximity, contact or under vacuum, UV-Nanoimprint
- Alignment: with CCD camera, programmable from front or back side
- Alignment precision : 0.5 µm with 20 X lens
ROUTINE PROCESS
Contact mode Photolithography
On : positive resists
- Minimum feature size : 0.6 µm
- Resist thickness : 0.5 µm to 10 µm
On : SU8
- Minimum feature size : –
- Resist thickness : 1 µm to 200 µm
ROUTINE PROCESS
Contact mode Photolithography
On : negative resists
- Minimum feature size : 0.7 µm
- Resist thickness : 0.7 µm to 10 µm
