Aligner (MA4)
Aligner (MA4)
Additional information
| MANUFACTURER | Karl Süss |
|---|---|
| MODEL | MA4 |
Samples
- Photomasks size : 178 mm (7 in.) maximum
- Samples size : 100 mm maximum
Characteristics
- Spectral selection : I-line
- Alignment: back-side
- Mask adaptor 76 mm and 100 mm
ROUTINE PROCESS
Contact Mode Photolithography
On positive resist
- Minimum feature size : 0.8 µm
- Thickness : from 1.4 µm to 10 µm
On lift-off resist
- Minimum feature size : 1 µm
- Thickness : from 0.1 µm to 950 µm
On image reversal resist
- Minimum feature size : 1 µm
- Thickness : from 1.1 µm to 2.0 µm
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.