Aligner (MA4)

$0.00

Description

Additional information

MANUFACTURER Karl Süss
MODEL MA4

Samples

  • Photomasks size  : 178 mm (7 in.) maximum
  • Samples size : 100 mm maximum

Characteristics

  • Spectral selection : I-line
  • Alignment: back-side
  • Mask adaptor 76 mm and 100 mm

 

ROUTINE PROCESS

Contact Mode Photolithography

On positive resist

  • Minimum feature size : 0.8 µm
  • Thickness : from 1.4 µm to 10 µm

On lift-off resist

  • Minimum feature size : 1 µm
  • Thickness : from 0.1 µm to 950 µm

On image reversal resist

  • Minimum feature size : 1 µm
  • Thickness : from 1.1 µm to 2.0 µm

Additional information

MANUFACTURER

Karl Süss

MODEL

MA4