Description
Additional information
| MANUFACTURER | N/A |
|---|---|
| MODEL | N/A |
Samples
- Samples size : from 1 mm to 50 mm
Characteristics
- Apparatus unique in Canada, allowing implantations up to 10 MeV
- Temperature : from – 190 °C to 300 °C
- Accelerating voltage : from 5 keV to 75 000 keV (depending on the ion)
ROUTINE PROCESS
Ion Implantation
- Material implanted: all solids
- Dose : from 1.00+10 to 1.00+18 atoms/cm2
