Ion Implantation (N/A)

$0.00

Description

Additional information

MANUFACTURER N/A
MODEL N/A

Samples

  • Samples size : from 1 mm to 50 mm

Characteristics

  • Apparatus unique in Canada, allowing implantations up to 10 MeV
  • Temperature : from – 190 °C to 300 °C
  • Accelerating voltage : from 5 keV to 75 000 keV (depending on the ion)

 

ROUTINE PROCESS

Ion Implantation

  • Material implanted: all solids
  • Dose : from 1.00+10 to 1.00+18 atoms/cm2

Additional information

MANUFACTURER

N/A

MODEL

N/A