Lithography / 5X Stepper aligner
Lithography / 5X Stepper aligner
| MANUFACTURER | ASML |
|---|---|
| MODEL | PAS5500 / 200B |
General description:
Aligner and multi-step imaging
Characteristics :
- 5X Stepper Aligner
- Resolution down to 350 nm
- Front-to-front alignment: 50 nm, 3 sigma
- Back-to-back alignment: 80 nm, 3 sigma
- Front-to-back alignment: 210 nm, 3 sigma
- Directly interfaced with TEL coating-developing track
- Dry film exposures
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.