Photoresist spin-coater and developer
Photoresist spin-coater and developer
| MANUFACTURER | TEL Tokyo Electron |
|---|---|
| MODEL | Cleantrack ACT-8 |
General description:
Photoresist spin-coater and developer
Characteristics :
- Has direct interface with ASML stepper
- Adapted to spin-coat negative tone and positive tone resists
- KMPR-1005 (1002), with 90° walls
- OIR-647-17(11), straight walls
- Allows cyclopentanone or HMDS pre-wet for respective resists
- Develops both positive and negative resists
- Includes soft-bake and post-exposure bake capabilities
- Develops dry films
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.