Atomic Force Microscopy (afm) (4500 UHV AFM/STM)

Atomic Force Microscopy (afm) (4500 UHV AFM/STM)

Additional information

MANUFACTURER JEOL
MODEL 4500 UHV AFM/STM

Samples

  • Sample size : 7 mm maximum (area probed : 3 mm)
  • Thickness: 2 mm maximum
  • Lateral resolution : atomic

Analyses

  • Modes: true non-contact (frequency feedback), tapping (amplitude feedback) and contact (deflection feedback)
  • Instrument made for ultrahigh vacuum measurements coupled to a scanning electron microscope (SEM, 20 nm resolution) allowing the observation and correction in real time of the STM/AFM tip position on the sample.
  • Ideal dimensions: 7mm×3 mm, 0.5 mm height (needed for heating-cleaning in-situ)
  • Pressure : less than 5×10-8
  • Noise level : ~ 0.05 nm RMS (Z direction) without the turbo pump.
  • Maximum scanning dimensions X and Y: 10 µm, Z: 2 µm
  • Additional signals available during rastering : friction (all modes), phase and amplitude (dynamic modes). The current can also be measured in all operating modes.
  • Equipped with a system capable of introducing a gas for deposition and molecular growth experiments
  • Electrostatic / electromecanic measurement module : Lock-in amplifier (Signal Recovery 7265), DC current source (Keithley 2400).

Applications

  • Study of nanostructure growth
  • ‘Material contrast’ via friction/adhesion detection (in contact mode) or from the phase of vibrations of the cantilever (in tapping mode).
  • Electric resistance mapping

To use this equipment

The equipment available is accessible to the academic and industrial research community.

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