Atomic Force Microscopy (afm) (VT UHV STM/AFM)

Description

Additional information

Samples

• Samples size : 9×5 mm² or 7 mm diameter maximum
• Thickness: 2 mm maximum
• Lateral resolution: atomic

Analysis

• Modes :
  • STM : current feedback
  • AFM: true non-contact mode (frequency feedback, system with quartz resonator and PLL to follow the resonance)
• Designed to work under UHV and produce images with atomic resolution for either operating modes (STM and AFM). The sample surface cleaning in performed in-situ via direct or indirect heating or by ion sputtering. The main advantage of this system is its ability to perform measurements within a wide range of temperatures, between 25 K and 1500 K.

Applications

• Surface-induced polymerization reactions
• Studies of surface processes
• Analysis of metals, semi-conductors and superconductors with atomic resolution
• Studies of surface phase change transitions
• Studies of inter-molecular interactions; self-assembly, self-organizing

Characteristics

• Measurement pressure: less than 3×10^-11
• Measurement temperature : 25 K to 1500 K
• Maximum X and Y scanning dimensions: 12 µm, Z: 1.5 µm
• LEED – Auger Electronic Spectroscopy
• VACSCAN MKS Mass Spectrometer
• ISE 10 ion source (Argon, Hydrogen, Oxygen)
• System of gas injection for experiments regarding deposition and molecular growth on  any substrate