Profilometry (XP-2)

$0.00

Description

Additional information

MANUFACTURER Ambios
MODEL XP-2

Analyses

  • Sampled depth: up to 50 nm
  • Samples thickness: 30 mm max, vertical range: 400 µm max
  • Vertical resolution: 1 Å to 10 µm, 15 Å to 100 µm
  • Lateral resolution: 100 nm

Applications

  • Dimensional characterization (height, width) of etch or lithographic features
  • Thin films stress measurement
  • Surface roughness characterization

Characteristics

  • Motorized 150 mm x 178 mm stage
  • Maximum length of a single scan: 60 mm; ability of digitally stitch scans up to 150 mm
  • Stylus force: programmable from 0.5 mg to 10 mg
  • Software for 3D rendering and stress measurement
  • Scan data digitally stored
  • Colour CCD camera with 40x to 160x motorized zoom
  • Anti-vibration table (Herzan DT-6050MV)
  • Removable 200 mm support for wafer stress measurement
  • NIST certified step height standards of 1 µm and 100 nm
  • 40 degree stylus of 2, 1 and 0.2 µm

Additional information

MANUFACTURER

Ambios

MODEL

XP-2