Atomic Force Microscopy (afm) (XE-150)
Atomic Force Microscopy (afm) (XE-150)
Additional information
| MANUFACTURER | Park Systems |
|---|---|
| MODEL | XE-150 |
Samples
- Samples sizes: Samples size: 150 mm (6 in) maximum
- Thickness: 25 mm (1 kg) maximum
Analysis
- Types : contact mode and non-contact mode
- Mainly used for non-destructive metrology on samples (etch and lithography) and characterization of thin films micro-roughness
Characteristics
- Lateral resolution: 1.5 nm (closed-loop), 0.01 nm (open-loop)
- Mapping available
- XY scanning with closed-loop feedback control
- XY scan dimensions: 100 x 100 µm2 – Vertical scan: 12 µm
- Z scan noise level: 0.05 nm (maximum)
- Motorized stage with maximum displacement of 225 × 150 mm (resolution: 0.5 µm)
- Programmable multiple points data acquisition
- CCD high resolution camera (Mpx) – maximum field of view 1680 x 1260 µm
- Anti-vibration table and acoustic chamber
- Very sharp tips for the metrology of high aspect ratio nanostructures
To use this equipment
The equipment available is accessible to the academic and industrial research community.
To learn about usage conditions and availability, please fill out the form below. After reviewing your request, we will contact you shortly to offer you the best available solution.