Atomic Force Microscopy (afm) (XE-150)

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Description

Additional information

MANUFACTURER Park Systems
MODEL XE-150

Samples

  • Samples sizes: Samples size: 150 mm (6 in) maximum
  • Thickness: 25 mm (1 kg) maximum

Analysis

  • Types : contact mode and non-contact mode
  • Mainly used for non-destructive metrology on samples (etch and lithography) and characterization of thin films micro-roughness

Characteristics

  • Lateral resolution: 1.5 nm (closed-loop), 0.01 nm (open-loop)
  • Mapping available
  • XY scanning with closed-loop feedback control
  • XY scan dimensions: 100 x 100 µm2 – Vertical scan: 12 µm
  • Z scan noise level: 0.05 nm (maximum)
  • Motorized stage with maximum displacement of 225 × 150 mm (resolution: 0.5 µm)
  • Programmable multiple points data acquisition
  • CCD high resolution camera (Mpx) – maximum field of view 1680 x 1260 µm
  • Anti-vibration table and acoustic chamber
  • Very sharp tips for the metrology of high aspect ratio nanostructures

Additional information

MANUFACTURER

Park Systems

MODEL

XE-150